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Condition:
  New
Part Number:
  P1013722
Warranty:
  Full Manufacturer's Warranty
Out of Stock  
Expecting:   2
Anticipated Arrival:  2 on 2024-12-21



$375.00


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Ideal Vacuum Circular Magnetron Sputtering Targets, CHROMIUM - Cr Sputtering Target, 3'' Diameter x 0.25" Thick, 99.95 Percent Purity


Ideal Vacuum Circular Magnetron Sputtering Targets, CHROMIUM - Cr Sputtering Target, 3'' Diameter x 0.25" Thick, 99.95 Percent Purity
Ideal Vacuum Products, LLC.

This product is a circular magnetron CHROMIUM - Cr sputtering target, with a 3'' diameter x 0.25" thickness. It is 99.95% pure.

We use a very competitive pricing strategy to ensure you receive the highest quality products at the best possible value, giving you both affordability and excellence in every purchase. We offer huge discounts to every customer, customers who place bulk orders will enjoy huge savings. We stock huge quantities of our products to give our customers guaranteed same day shipping after placing an order. This short lead time is loved by all our customers who look to manage their cash flow with quicker turnaround times. Our regular customers can maintain lower inventory levels, decreasing storage costs and minimizing the risk of obsolescence. Buying from Ideal Vacuum means a customer receives their product more quickly, enhancing satisfaction and meeting their urgent needs. This also enables our customers to stay ahead of their competition by quickly adapting to new trends and demands.

CHROMIUM - Cr

Chromium (Cr) sputtering targets are widely used in thin-film coatings due to chromium's excellent mechanical, chemical, and optical properties. Here’s a concise summary of chromium sputtering targets in thin-film coatings:

1. Material Properties:
High Hardness: Chromium is a very hard material, making it ideal for thin films that require wear resistance and durability.
Corrosion Resistance: Chromium has excellent corrosion resistance, particularly in harsh environments, making it useful for protective coatings.
Adhesion Promoter: Chromium thin films are often used to improve adhesion between different layers, particularly in multilayer coatings.

2. Deposition Methods:
DC Sputtering: Chromium is a conductive material, so DC magnetron sputtering is commonly used for deposition, ensuring high deposition rates and uniform films.
RF Sputtering: RF sputtering may be used in specialized applications, particularly in reactive environments to form chromium compounds.
Reactive Sputtering: Chromium is often sputtered in the presence of reactive gases (e.g., oxygen or nitrogen) to form chromium oxide (Cr2O3) or chromium nitride (CrN), which have specific uses.

3. Applications:
Decorative Coatings: Chromium is used in decorative thin films for items like watches, jewelry, and automotive trim due to its shiny, reflective finish and durability.
Protective Coatings: Chromium thin films provide wear resistance and corrosion protection, making them ideal for tools, machinery parts, and chemical processing equipment.
Microelectronics: Chromium is used in thin-film resistors, electrical contacts, and diffusion barriers in semiconductor devices due to its stability and conductivity.
Optical Coatings: Chromium thin films are used in reflective coatings and anti-reflective coatings for optical devices, mirrors, and filters.
Hard Coatings: Chromium compounds such as chromium nitride (CrN) are used in hard coatings for cutting tools, wear-resistant surfaces, and mechanical parts.

4. Film Properties:
Mechanical Strength: Chromium thin films are hard and durable, providing excellent protection in demanding applications such as tooling and industrial equipment.
Corrosion Resistance: Chromium films resist oxidation and corrosion, making them ideal for protective coatings in harsh chemical environments.
Adhesion: Chromium is often used as an adhesion layer in multilayer coatings, helping to bond metals, glass, and other materials.
Optical Reflectivity: Chromium thin films offer good reflectivity and are used in optical and decorative coatings for their shiny metallic appearance.

5. Reactive Deposition:
Chromium Oxide (Cr2O3): Formed through reactive sputtering in an oxygen environment, chromium oxide is used for its hardness, wear resistance, and corrosion protection in high-performance applications.
Chromium Nitride (CrN): Formed by sputtering chromium in a nitrogen atmosphere, CrN is used in hard coatings for cutting tools and other wear-resistant applications.

6. Challenges:
Target Poisoning: In reactive sputtering processes (e.g., forming Cr2O3 or CrN), target poisoning can occur, reducing the sputtering efficiency by forming non-metallic compounds on the target surface.
Film Stress: Chromium films can develop internal stress during deposition, affecting film adhesion and mechanical properties, especially in thick layers.

Summary:
Chromium (Cr) sputtering targets are widely used in thin-film coatings for protective layers, decorative finishes, optical coatings, and microelectronics due to their high hardness, corrosion resistance, and excellent adhesion properties. DC sputtering is typically used for efficient chromium deposition, while reactive sputtering allows the formation of compounds like chromium oxide (Cr2O3) and chromium nitride (CrN), which are used in hard coatings for cutting tools and other demanding applications. Chromium films provide a combination of durability, protection, and reflective properties, making them versatile for a broad range of industries.





Notes:
Metallic or elastomer backing plate bonding is recommended for all dielectric target materials because these materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity. These targets are most susceptible to thermal shock due to their low thermal conductivity and hence, may require specific power ramp up and ramp down procedures during start up and shut down steps.


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Ideal Spectroscopy
5910 Midway Park Blvd NE,
Albuquerque, NM 87109-5805

Phone: (505) 872-0037
Fax: (505) 872-9001
info@idealspectroscopy.com



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