Ideal Vacuum Circular Magnetron Sputtering Targets, NIOBIUM OXIDE- Nb2O5 Sputtering Target, 3'' Diameter x 0.125" Thick, 99.995 Percent Purity, Metallic Bonded to a OFHC Copper Backing Plate.
Ideal Vacuum Products, LLC.
This product is a circular magnetron NIOBIUM OXIDE- Nb2O5 sputtering target, with a 3'' diameter x 0.125" thickness. It is 99.995% pure, and is metallically bonded to a OFHC (Oxygen-Free High Conductivity) copper backing plate.
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NIOBIUM OXIDE- Nb2O5
Niobium Oxide (Nb2O5) is a valuable material for thin films due to its excellent optical, dielectric, and catalytic properties. Here's a summary of its key characteristics:
1. Refractive Index:
Refractive Index: ~2.2 to 2.4 (at 550 nm), making it a high-index material.
Its high refractive index makes it ideal for optical coatings, especially in multilayer structures like anti-reflective coatings, optical filters, and waveguides.
2. Optical Transparency:
Transmission Window: Nb2O5 is transparent from the visible to the infrared range (~400 nm to 5 µm), making it suitable for a wide range of optical applications.
It is commonly used in optical coatings for lenses, mirrors, and photonic devices.
3. Dielectric Properties:
High Dielectric Constant: Nb2O5 has a high dielectric constant (20-40), which makes it useful in capacitors, memory devices, and other electronic components requiring high capacitance.
It is also utilized as a gate dielectric material in thin-film transistors.
4. Chemical and Thermal Stability:
Nb2O5 is chemically stable and resistant to corrosion. It offers excellent stability under high temperatures, making it a reliable material for thin films used in demanding environments.
Its thermal stability ensures its performance in applications exposed to high temperatures.
5. Mechanical Properties:
Nb2O5 is hard and durable, providing excellent mechanical strength to thin-film coatings, making it useful for protective coatings and abrasion-resistant layers.
6. Deposition Methods:
Nb2O5 thin films can be deposited using various techniques, including RF sputtering, reactive sputtering (using niobium metal with oxygen gas), thermal evaporation, and electron-beam evaporation.
It can also be deposited by atomic layer deposition (ALD) for high-precision thin films.
7. Applications:
Optical Coatings: Used in anti-reflective coatings, optical filters, and waveguides due to its high refractive index and transparency.
Microelectronics: Nb2O5 is employed in capacitors, thin-film transistors, and as a high-k dielectric material in semiconductor devices.
Catalysis: Nb2O5 is also known for its catalytic properties and is used in applications such as photocatalysis and fuel cells.
Protective Coatings: Provides excellent wear resistance and corrosion protection in industrial applications.
Summary:
Niobium Pentoxide (Nb2O5) is a high-refractive-index material with excellent optical and dielectric properties, making it a popular choice for optical coatings and electronic applications. Its chemical stability, dielectric constant, and high transparency make it suitable for a variety of thin-film applications, including capacitors, anti-reflective coatings, and photonic devices.
Notes:
Metallic or elastomer backing plate bonding is recommended for all dielectric target materials because these materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity. These targets are most susceptible to thermal shock due to their low thermal conductivity and hence, may require specific power ramp up and ramp down procedures during start up and shut down steps.
