These Agilent Varian TwisTorr 84 FS turbomolecular vacuum pumps have a Conflat CF 4.5 inlet flange, with 67 L/S pumping speed. The 84 FS turbo pumps are a supercharged version of the 74 FS, its 1350 Hz overclocked drive frequency allows for a 10% boost in pumping speed, making it a specialized pump for the ultra-high vacuum (UHV). For most general high vacuum (HV) applications, Ideal Vacuum recommends the more economic-dependable 74 FS turbo pump models. These amped-up Agilent 84 FS turbo pumps create a higher compression ratio for light gases, such as Hydrogen and Helium, to deliver an elevated throughput and reach the lowest ultimate pressure. The Agilent Varian TwisTorr 84 FS turbo pumps, with conflat intake, are true ultra-high vacuum (UHV) pumps having an ultimate pressure as low as 3.75x10-10 Torr when used correctly, for example, the Conflat versions of these pumps allow the intake flange to be baked up to 120 degrees Celsius. These TwisTorr 84-FS turbo pumps require a cooling kit, either fan forced-air or water cooling, along with an outboard remote rack-mount or onboard pump-side-mounted controller, all are sold separately by Ideal Vacuum.

These Agilent Varian TwistTorr 84 FS turbo pumps have a Conflat CF 4.5 inlet flange, has a pumping speed of 67 L/S of nitrogen, a KF-16 foreline flange, and ambient operating temperature from 5 °C to +35 °C. These 84 FS turbo pumps have a start up time of less than 2 minutes, rotational speed of 81,000 rpm, and recommended foreline roughing pumps of either dry scroll (IDP-3 or IDP7) or oil-sealed rotary vane (DS-40M or DS-102). The cooling requirements for forced-air cooling are ambient air temperature of 5 to 35 °C or with water cooling are a minimum flow of 0.30 gpm, between 15 to 25 °C at 45 to 75 psi.

The new Agilent Twistorr 84 FS offers a blend of performance and features that is suited for a wide range of UHV applications. It can be used in a variety of fields:

Typical Turbo Pump Applications Include:

• Mass Spectrometry
• Gas Chromatography Mass Spectrometry (GC/MS)
• Liquid Chromatography Mass Spectrometry (LC/MS)
• Inductively Coupled Plasma Mass Spectrometry (ICP-MS)
• Time-of-Flight Mass Spectrometry (TOF)

Vacuum in Research and Development:

• High Energy Physics
• Fusion Technology
• General UHV Research
• Synchrotron Light Sources Particle Accelerators

Nanotechnology Instruments:

• Electron Microscopy
• Scanning Electron Microscopy (SEM)
• Transmission Electron Microscopy (TEM)
• Focused Ion-beam Systems (FIB)
• Surface Analysis
• Semiconductor Manufacturing

Industrial Vacuum Processing:
Thin Film Deposition:

• Glass coating equipment (architectural and automotive glass, flat panel displays)
• Thin film solar cells production (photo-voltaic)
• Optical data media (CD, DVD, Magneto Optical Discs)
• Magnetic storage media
• Surface treatments
• Optical coating (ophthalmic, precision opto-electronics)
• Roll/Web coating on films or foils

Device Processing:

• TV & Monitor picture tube manufacture
• Evacuation of lamps (motorway lighting, beamers)
• X-Ray tubes & electron devices

General Processes:

• Vacuum Furnaces
• Metallurgy