Ideal Vacuum PVD Materials, Hafnium Pellets - Hf, 99.95% (3N5) Purity, Hafnium Melting Point 2227 °C, 1 - 6 mm Pellet Size, 100 Grams, Thermal Evaporation Materials, E-beam Deposition Materials, Hafnium Metal Thin Films, Part Number: P1013584
Ideal Vacuum Products, LLC.

We supply high quality PVD evaporation materials for your process.

This product is a bottle of 100 grams of high purity hafnium pellets (99.95%) that are 1 x 6 mm in size and ships in PET plastic bottles. These pieces have a density of 13.31 g/cc, a melting point of 2,227 °C, and a vapor pressure of 10-4 Torr at 3,090 °C. Its coefficient of thermal expansion is 5.9 x 10-6/K, and it has a Z ratio of 0.36.

We use a very competitive pricing strategy to ensure you receive the highest quality products at the best possible value, giving you both affordability and excellence in every purchase. We offer discounts to every customer, customers who place bulk orders will enjoy deeper discounts. We carry a large stocking inventory of PVD evaporation materials so that most orders ship out the same day that the order is placed. This short lead time is loved by all our customers who look to manage their cash flow, maintain lower inventory levels, and decrease storage costs. Buying from Ideal Vacuum means a customer receives their product quickly, enhancing satisfaction, while meeting their urgent inventory needs. This also enables our customers to stay ahead of their competition by quickly adapting to new trends and demands.

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Hafnium
Hafnium is a valuable material in thin film applications due to its unique properties, such as high melting point, excellent corrosion resistance, and ability to form stable oxides.

Thin Films Applications of Hafnium

Electronics and Microelectronics: Gate Dielectrics: Hafnium oxide (HfO2) is widely used in modern semiconductor devices as a high-k (high dielectric constant) gate dielectric material in transistors. It replaces silicon dioxide (SiO2) in advanced CMOS technology nodes to reduce gate leakage and enable further miniaturization of electronic components.
Capacitors: HfO2 is also utilized in capacitors, where its high dielectric constant allows for greater capacitance in a smaller volume, enhancing the performance of various electronic devices.

Wear-Resistant Coatings: Mechanical Applications: Hafnium thin films are applied as wear-resistant coatings in mechanical components subjected to extreme conditions. The films help to extend the life of these components by providing a hard, durable surface.

Nuclear Applications: Control Rod Coatings: Hafnium's neutron absorption capabilities make it a material of choice in nuclear reactors, where it is used in control rods. Thin films of hafnium or its alloys are applied to control rods to enhance their performance and lifespan.

Optical Applications: High-Index Layers: Hafnium oxide thin films are used in optical coatings, particularly in anti-reflective coatings, mirrors, and lenses. Its high refractive index and transparency in the visible and near-infrared regions make it ideal for these applications.
Laser Coatings: HfO2 is used in coatings for laser optics due to its ability to withstand high laser power without degrading, ensuring durability and performance in high-power laser systems.

Hafnium's unique combination of high dielectric constant, corrosion resistance, high refractive index, and stability under extreme conditions makes it a highly versatile material in thin film applications. It is used extensively in electronics, optics, protective coatings, nuclear technology, and catalysis, contributing significantly to advancements in these fields.

Ideal Vacuum Products supplies a wide size range of evaporation materials at a very competitive price and short lead time. We also take custom pellet size orders to meet your specific requirements. Please reach out to our sales team for any inquiries.